We provides photoresists suitable for lift-off process and pss (Pattern Sapphire Substrate)process.We also provides a full array of related materials, including wafer polish slurries and developer.Due to our commitment to customer service, we developed technologies of ultra-clean manufacturing pp-level analysis and microlithography to ensure the quality of our products.
product |
Appliation Rang |
advantage |
ENPI205 |
ENPI205 series
are alkaline developable negative photoresists suitable for lift-off proess. |
excellent
adhesion/excellent strippable. |
ENPI202 |
ENPI202
series are alkaline developable negative photoresists suitable for lift-off
proess. |
excellent
adhesion/excellent strippable. |
|