| product |
Appliation Rang |
advantage |
| ESR610 |
|
|
| ESR301 |
ESR301
is designed especially for LiTa03 LiNbO3 substrates Lt delivers a
high-removal-surface for primary polishing . |
with
1~2times water dilutionhighly dispersed colloidal silica cbrasives with
special formulation . |
| ESR302 |
The
high-removal-rate of ESR302 is suitable for primary polishing ，and reduces
the time of final polishing process ESR302 is also suitable for circulating
operation and exhibits high thermal atability. |
primary
polishing of sapphire substrate，with 1~2times water dilution. |
| ESR303 |
with
excellent dispersion，uniform particle size，ESR303 plus and high stability，
providewide process. |
primary
and final polishing of sapphire substrate. |
| ESR327 |
ESR327
is designed for sapphire a-plane,and the removal rate of esr327 is 50\\% higher
than competitor. |
sapphire(a-plane),cover
lens of cell phone and watch polishing. |
