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We provides photoresists suitable for lift-off process and pss (Pattern Sapphire Substrate)process.We also provides a full array of related materials, including wafer polish slurries and developer.Due to our commitment to customer service, we developed technologies of ultra-clean manufacturing pp-level analysis and microlithography to ensure the quality of our products.
| product |
Appliation Rang |
advantage |
| ESR236 |
ESR236 delivers
a high-removal-rate and secondary polishing silicon wafers ,it is able to
achieve excellent processing efficiency an prolong pad liferime.ESR 236 is
suitable for both non-circulating and circulating system ,thereby can reduce
the producing costs and raise the process yield. |
silicom wafers
polishing,with 20-30times water dilutiong. |
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